2024 journal article
Selected Area Manipulation of MoS2 via Focused Electron Beam-Induced Etching for Nanoscale Device Editing
ACS Applied Materials & Interfaces.
By: J. Lasseter *, S. Gellerup *, S. Ghosh *, S. Yun *, R. Vasudevan *, R. Unocic* , O. Olunloyo*, S. Retterer * ...and 3 other authors, K. Xiao *, S. Randolph * & P. Rack *
We demonstrate direct-write patterning of single and multilayer MoS