1998 article

Flat-flame diamond CVD: the effect of pressure and operating conditions for specific applications

Wolden, C. A., Davis, R. F., Sitar, Z., & Prater, J. T. (1998, February). DIAMOND AND RELATED MATERIALS, Vol. 7, pp. 133–138.

By: C. Wolden n, R. Davis n, Z. Sitar n & J. Prater*

co-author countries: United States of America πŸ‡ΊπŸ‡Έ
author keywords: boron doping; combustion synthesis; low temperature; texture
Source: Web Of Science
Added: August 6, 2018

The radial uniformity and scaleable nature of flat flames make them an attractive technique for diamond deposition The advantages of low-pressure operation relative to atmospheric operation are discussed with respect to reactor design, heat transfer considerations and flame stability. The thermochemistry and kinetics of flat flames are described in regard to process optimization. Examples are provided to describe how to tailor the low-pressure process for the following applications: morphology control for the production of <100> textured films, low-temperature deposition and the introduction of dopants.