2019 journal article

Analysis and Experimental Quantification of 1.2-kV 4H-SiC Split-Gate Octagonal MOSFET

IEEE ELECTRON DEVICE LETTERS, 40(7), 1163–1166.

By: K. Han n & B. Baliga n

co-author countries: United States of America πŸ‡ΊπŸ‡Έ
author keywords: Silicon carbide; 4H-SiC; MOSFET; cell design; octagonal; OCTFET; split-gate; C-gd; Q(gd); HF-FOMs
Source: Web Of Science
Added: July 22, 2019

A1.2-kV rated 4H-SiC split-gate octagonal cell MOSFET (SG-OCTFET) is proposed and successfully fabricated in a 6-in foundry for the first time. The measured results quantify the benefits of the SG-OCTFET structure: improvement in high-frequency figures of merit (HF-FOM) (R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</sub> Γ— C <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">gd</sub> ) by 1.8Γ—, HF-FOM (R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</sub> Γ— Q <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">gd</sub> ) by 1.6Γ—, and FOM (C <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">iss</sub> /C <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">gd</sub> ) by 1.6Γ— compared with the optimized compact OCTFET design due to the reduced gate-to-drain overlap area. An important conclusion of this letter is that unlike commercially available 1.2-kV SiC power MOSFETs with linear cell topology, the 1.2-kV SG-OCTFET design can outperform commercially available 600-V Si super-junction devices.