2012 journal article

Deep-Ultraviolet Light-Emitting Diodes Fabricated on AlN Substrates Prepared by Hydride Vapor Phase Epitaxy

APPLIED PHYSICS EXPRESS, 5(12).

By: T. Kinoshita*, K. Hironaka*, T. Obata*, T. Nagashima*, R. Dalmau*, R. Schlesser*, B. Moody*, J. Xie* ...

co-author countries: Japan 🇯🇵 United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were fabricated on AlN substrates. The AlN substrates were prepared by growing thick hydride vapor phase epitaxy (HVPE)-AlN layers on bulk AlN substrates prepared by physical vapor transport (PVT). After growing an LED structure, the PVT-AlN substrates were removed by mechanical polishing. This process allowed the fabrication of DUV-LEDs on HVPE-AlN substrates with high crystalline quality and DUV optical transparency. The DUV-LEDs exhibited a single emission peaking at 268 nm through the HVPE-AlN substrates. The output power as high as 28 mW was obtained at an injection current of 250 mA.