2024 journal article

Selected Area Manipulation of MoS2 via Focused Electron Beam-Induced Etching for Nanoscale Device Editing

ACS Applied Materials & Interfaces.

By: J. Lasseter *, S. Gellerup*, S. Ghosh *, S. Yun*, R. Vasudevan *, R. Unocic* , O. Olunloyo*, S. Retterer * ...

Source: ORCID
Added: August 14, 2024

We demonstrate direct-write patterning of single and multilayer MoS