A. H. Somasekhar

Somashekhar, A., Ying, H., Smith, P. B., Aldrich, D. B., & Nemanich, R. J. (1999, June 1). Hydrogen Plasma Removal of Post‐RIE Residue for Backend Processing. Journal of The Electrochemical Society. https://doi.org/10.1149/1.1391933