Works (2)

1997 journal article

Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine

Journal of the Electrochemical Society, 144(9), 3309–3315.

By: P. O'Neil, M. Ozturk, K. Violette, D. Batchelor, K. Christensen & D. Maher

Source: NC State University Libraries
Added: August 6, 2018

1996 conference paper

Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition

Rapid thermal and integrated processing V: Symposium held April 8-12, 1996, San Francisco, California, U.S.A. (Materials Research Society symposium; 429), 343–347.

Source: NC State University Libraries
Added: August 6, 2018