1997 journal article
Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315.
1996 article
Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition
RAPID THERMAL AND INTEGRATED PROCESSING V, Vol. 429, pp. 343–347.
Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.
Certain data included herein are derived from the Web of Science© and InCites© (2024) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.