Works (2)
1997 article
Optimization of Process Conditions for Selective Silicon Epitaxy Using Disilane, Hydrogen, and Chlorine
O'Neil, P. A., Öztürk, M. C., Violette, K. E., Batchelor, D., Christensen, K., & Maher, D. M. (1997, September 1). Journal of The Electrochemical Society.
1996 article
Sub-Half Micron Elevated SourceDrain NMOSFETS by Low Temperature Selective Epitaxial Deposition
Sun, J., Bartholomew, R. F., Bellur, K., O'Neil, P. A., Srivastava, A., Violette, K. E., … Masnari, N. A. (1996, January 1). MRS Proceedings.
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