Katherine E. Violette

Works (2)

Updated: July 5th, 2023 16:04

1997 journal article

Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315.

By: P. ONeil n, M. Ozturk n, K. Violette n, D. Batchelor n, K. Christensen n & D. Maher n

topics (OpenAlex): Silicon and Solar Cell Technologies; Thin-Film Transistor Technologies; Semiconductor materials and devices
Source: Web Of Science
Added: August 6, 2018

1996 article

Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition

RAPID THERMAL AND INTEGRATED PROCESSING V, Vol. 429, pp. 343–347.

By: J. Sun n, R. Bartholomew n, K. Bellur n, P. ONeil n, A. Srivastava n, K. Violette n, M. Ozturk, C. Osburn n, N. Masnari n

topics (OpenAlex): Semiconductor materials and devices; Advancements in Semiconductor Devices and Circuit Design; Thin-Film Transistor Technologies
Source: Web Of Science
Added: August 6, 2018

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