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Works (2)
1997 journal article
Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315.
1996 article
Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition
RAPID THERMAL AND INTEGRATED PROCESSING V, Vol. 429, pp. 343–347.