Katherine E. Violette

Works (2)

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1997 journal article

Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315.

By: P. ONeil, M. Ozturk, K. Violette, D. Batchelor, K. Christensen & D. Maher

Source: Web Of Science
Added: August 6, 2018

1996 article

Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition

RAPID THERMAL AND INTEGRATED PROCESSING V, Vol. 429, pp. 343–347.

By: J. Sun, R. Bartholomew, K. Bellur, P. ONeil n, A. Srivastava, K. Violette, M. Ozturk, C. Osburn, N. Masnari

Source: Web Of Science
Added: August 6, 2018