1997 journal article
Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine
Journal of the Electrochemical Society, 144(9), 3309–3315.
1996 conference paper
Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition
Rapid thermal and integrated processing V: Symposium held April 8-12, 1996, San Francisco, California, U.S.A. (Materials Research Society symposium; 429), 343–347.
