Katherine E. Violette

ONeil, P. A., Ozturk, M. C., Violette, K. E., Batchelor, D., Christensen, K., & Maher, D. M. (1997). Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315. https://doi.org/10.1149/1.1838003

Sun, J., Bartholomew, R. F., Bellur, K., ONeil, P. A., Srivastava, A., Violette, K. E., … Masnari, N. A. (1996). Sub-half micron elevated source/drain NMOSFETs by low temperature selective epitaxial deposition. RAPID THERMAL AND INTEGRATED PROCESSING V, Vol. 429, pp. 343–347. https://doi.org/10.1557/proc-429-343