Works (12)
2005 article
A Comparison of Thickness Values for Very Thin SiO[sub 2] Films by Using Ellipsometric, Capacitance-Voltage, and HRTEM Measurements
Ehrstein, J., Richter, C., Chandler-Horowitz, D., Vogel, E., Young, C., Shah, S., … Diebold, A. (2005, December 21). Journal of The Electrochemical Society.
2002 article
Observation of latent reliability degradation in ultrathin oxides after heavy-ion irradiation
Suehle, J. S., Vogel, E. M., Roitman, P., Conley, J. F., Johnston, A. H., Wang, B., … Weintraub, C. E. (2002, February 18). Applied Physics Letters.
2001 article
Study of low-frequency charge pumping on thin stacked dielectrics
Weintraub, C. E., Vogel, E., Hauser, J. R., Yang, N., Misra, V., Wortman, J. J., … Masson, P. (2001, January 1). IEEE Transactions on Electron Devices, Vol. 48, pp. 2754–2762.
2000 article
Analysis of leakage currents and impact on off-state power consumption for CMOS technology in the 100-nm regime
Henson, W. K., Yang, N., Kubicek, S., Vogel, E. M., Wortman, J. J., Meyer, K. D., & Naem, A. (2000, July 1). IEEE Transactions on Electron Devices.
2000 journal article
Limitations of conductance to the measurement of the interface state density of MOS capacitors with tunneling gate dielectrics
IEEE Transactions on Electron Devices, 47(3), 601–608.
1999 article
Electrical properties of oxynitride thin films using noise and charge pumping measurements
Masson, P., Morfouli, P., Autran, J. L., Brini, J., Balland, B., Vogel, E. M., & Wortman, J. J. (1999, April 1). Journal of Non-Crystalline Solids.
1999 article
Estimating oxide thickness of tunnel oxides down to 1.4 nm using conventional capacitance-voltage measurements on MOS capacitors
Henson, W. K., Ahmed, K. Z., Vogel, E. M., Hauser, J. R., Wortman, J. J., Venables, R. D., … Venables, D. (1999, April 1). IEEE Electron Device Letters.
1999 article
Modeling the trends in valence-band electron tunneling in NMOSFETs with ultrathin SiO2 and dielectrics with oxide scaling
Shanware, A., Massoud, H. Z., Vogel, E., Henson, K., Hauser, J. R., & Wortman, J. J. (1999, September 1). Microelectronic Engineering.
1998 journal article
Effects of Si source gases (SiH4 and Si2H6) on polycrystalline- Si1-xGex deposited on oxide by RTCVD
Electrochemical and Solid State Letters, 1(3), 153–155.
1998 article
Evaluation Of 2.0 nm Grown and Deposited Dielectrics in 0.1 μm PMOSFETs
Srivastava, A., Heinisch, H. H., Vogel, E., Parker, C., Osburn, C. M., Masnari, N. A., … Hauser, J. R. (1998, January 1). MRS Proceedings.
Ed(s):
1998 article
Modeled tunnel currents for high dielectric constant dielectrics
Vogel, E. M., Ahmed, K. Z., Hornung, B., Henson, W. K., McLarty, P. K., Lucovsky, G., … Wortman, J. J. (1998, June 1). IEEE Transactions on Electron Devices.
1997 article
Electrical and reliability properties of thin silicon oxinitride dielectrics formed by low pressure rapid thermal chemical vapor deposition
Morfouli, P., Ghibaudo, G., Vogel, E. M., Hill, W. L., Misra, V., McLarty, P. K., & Wortman, J. J. (1997, July 1). Solid-State Electronics, Vol. 41, pp. 1051–1055.