Gary W. Rubloff

Lu, G. Q., Tedder, L. L., & Rubloff, G. W. (1999). Process sensing and metrology in gate oxide growth by rapid thermal chemical vapor deposition from SiH4 and N2O. Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 17(4), 1417–1423.

Lu, G. Q., Bora, M., Tedder, L. L., & Rubloff, G. W. (1998). Integrated dynamic simulation of rapid thermal chemical vapor deposition of polysilicon. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 11(1), 63–74. https://doi.org/10.1109/66.661286

Lu, G. Q., Rubloff, G. W., & Durham, J. (1997). Contamination control for gas delivery from a liquid source in semiconductor manufacturing. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 10(4), 425–432. https://doi.org/10.1109/66.641484

Lu, G. Q., Bora, M., & Rubloff, G. W. (1997). Polysilicon RTCVD process optimization for environmentally-conscious manufacturing. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 10(3), 390–398. https://doi.org/10.1109/66.618212