1999 journal article
Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
APPLIED PHYSICS LETTERS, 75(25), 4001–4003.
By: T. Klein, D. Niu, W. Epling n, W. Li, D. Maher, C. Hobbs*, R. Hegde*, I. Baumvol*, G. Parsons
