1999 journal article

Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2o3 thin films on Si(100)

Applied Physics Letters, 75(25), 4001–4003.

By: T. Klein, D. Niu, W. Epling, W. Li, D. Maher, C. Hobbs, R. Hegde, I. Baumvol, G. Parsons

Source: NC State University Libraries
Added: August 6, 2018