Works (3)
Updated: July 5th, 2023 16:04
1999 journal article
A low-thermal-budget in situ doped multilayer silicon epitaxy process for MOSFET channel engineering
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(3), 1189–1196.
Sources: Web Of Science, NC State University Libraries
Added: August 6, 2018
1999 journal article
In situ phosphorus doping during silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(11), 4303–4308.
UN Sustainable Development Goal Categories
6. Clean Water and Sanitation
(OpenAlex)
Source: Web Of Science
Added: August 6, 2018
1997 journal article
Suppression of oxidation-enhanced boron diffusion in silicon by carbon implantation and characterization of MOSFET's with carbon-implanted channels
IEEE TRANSACTIONS ON ELECTRON DEVICES, 44(9), 1544–1551.
UN Sustainable Development Goal Categories
7. Affordable and Clean Energy
(Web of Science)
Source: Web Of Science
Added: August 6, 2018
Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.
Certain data included herein are derived from the Web of Science© and InCites© (2024) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
