1999 journal article
A low-thermal-budget in situ doped multilayer silicon epitaxy process for MOSFET channel engineering
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(3), 1189–1196.
1999 journal article
In situ phosphorus doping during silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(11), 4303–4308.
1997 journal article
Suppression of oxidation-enhanced boron diffusion in silicon by carbon implantation and characterization of MOSFET's with carbon-implanted channels
IEEE TRANSACTIONS ON ELECTRON DEVICES, 44(9), 1544–1551.
