2001 journal article
Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 19(5), 2622–2628.
2000 journal article
H loss mechanism during anneal of silicon nitride: Chemical dissociation
JOURNAL OF APPLIED PHYSICS, 88(10), 6055–6059.
