2001 journal article
Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 19(5), 2622–2628.
2000 journal article
H loss mechanism during anneal of silicon nitride: Chemical dissociation
JOURNAL OF APPLIED PHYSICS, 88(10), 6055–6059.
Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.
Certain data included herein are derived from the Web of Science© and InCites© (2024) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.