Works (2)

Updated: July 5th, 2023 16:01

2001 journal article

Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 19(5), 2622–2628.

By: C. Boehme n & G. Lucovsky n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

2000 journal article

H loss mechanism during anneal of silicon nitride: Chemical dissociation

JOURNAL OF APPLIED PHYSICS, 88(10), 6055–6059.

By: C. Boehme n & G. Lucovsky n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

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