Christoph Boehme

Boehme, C., & Lucovsky, G. (2001). Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 19(5), 2622–2628. https://doi.org/10.1116/1.1398538

Boehme, C., & Lucovsky, G. (2000). H loss mechanism during anneal of silicon nitride: Chemical dissociation. JOURNAL OF APPLIED PHYSICS, 88(10), 6055–6059. https://doi.org/10.1063/1.1321730