Works (2)

Updated: July 5th, 2023 16:01

2015 journal article

Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 33(5).

By: S. King n, R. Davis n, R. Carter n, T. Schneider n & R. Nemanich n

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Surface residue island nucleation in anhydrous HF/alcohol vapor processing of Si surfaces

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(9), 3512–3518.

By: R. Carter n, . Hauser n & R. Nemanich n

Source: Web Of Science
Added: August 6, 2018