2015 journal article
Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 33(5).
2000 journal article
Surface residue island nucleation in anhydrous HF/alcohol vapor processing of Si surfaces
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(9), 3512–3518.
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