2015 journal article
Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 33(5).
2000 journal article
Surface residue island nucleation in anhydrous HF/alcohol vapor processing of Si surfaces
Journal of the Electrochemical Society, 147(9), 3512–3518.
