2015 journal article

Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 33(5).

By: S. King, R. Davis, R. Carter, T. Schneider & R. Nemanich

Source: NC State University Libraries
Added: August 6, 2018

2000 journal article

Surface residue island nucleation in anhydrous HF/alcohol vapor processing of Si surfaces

Journal of the Electrochemical Society, 147(9), 3512–3518.

By: R. Carter, J. Hauser & R. Nemanich

Source: NC State University Libraries
Added: August 6, 2018