Richard Jerome Carter

King, S. W., Davis, R. F., Carter, R. J., Schneider, T. P., & Nemanich, R. J. (2015). Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces. Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 33(5). https://doi.org/10.1116/1.4926733

Carter, R. J., Hauser, J. R., & Nemanich, R. J. (2000). Surface residue island nucleation in anhydrous HF/alcohol vapor processing of Si surfaces. Journal of the Electrochemical Society, 147(9), 3512–3518. https://doi.org/10.1149/1.1393929