Salih Muhsin Celik

Low thermal budget surface preparation for selective epitaxy a study on process robustness

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(4), 1557–1564.

Low thermal budget in situ surface cleaning for selective silicon epitaxy

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(10), 3602–3609.

A 0.18 ?m CMOS technology for elevated source/drain MOSFETs using selective silicon epitaxy

ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology (Proceedings (Electrochemical Society); v. 97-3), 571–585. Pennington, NJ: Electrochemical Society.