1998 article

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Smith, L. L., Read, W. W., Yang, C. S., Srinivasan, E., Courtney, C. H., Lamb, H. H., & Parsons, G. N. (1998, May 1). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Vol. 16, pp. 1316–1320.

By: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

Contributors: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

topics (OpenAlex): Thin-Film Transistor Technologies; Semiconductor materials and devices; Silicon Nanostructures and Photoluminescence
Sources: NC State University Libraries, ORCID, NC State University Libraries
Added: August 6, 2018

1998 article

Remote Plasma‐Enhanced Chemical Vapor Deposition of SiO2 Using Ar/  N 2 O  and SiH4

Courtney, C. H., Smith, B. C., & Lamb, H. H. (1998, November 1). Journal of The Electrochemical Society.

By: C. Courtney n, B. Smith n & H. Lamb n

topics (OpenAlex): Metal and Thin Film Mechanics; Semiconductor materials and devices; Diamond and Carbon-based Materials Research
Source: Web Of Science
Added: August 6, 2018

Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.

Certain data included herein are derived from the Web of Science© and InCites© (2026) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.