1998 journal article

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 16(3 pt.1), 1316–1320.

By: L. Smith, W. Read, C. Yang, E. Srinivasan, C. Courtney, H. Lamb, G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Remote plasma-enhanced chemical vapor deposition of SiO2 usingAr/N2O and SiH4

Journal of the Electrochemical Society, 145(11), 3957–3962.

By: C. Courtney, B. Smith & H. Lamb

Source: NC State University Libraries
Added: August 6, 2018