Works (2)
1998 article
Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation
Smith, L. L., Read, W. W., Yang, C. S., Srinivasan, E., Courtney, C. H., Lamb, H. H., & Parsons, G. N. (1998, May 1). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Vol. 16, pp. 1316–1320.
Contributors: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, n, H. Lamb n, G. Parsons n
1998 article
Remote Plasma‐Enhanced Chemical Vapor Deposition of SiO2 Using Ar/ N 2 O and SiH4
Courtney, C. H., Smith, B. C., & Lamb, H. H. (1998, November 1). Journal of The Electrochemical Society.