Works (2)

Updated: July 5th, 2023 16:03

1998 journal article

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science &Amp; Technology a-Vacuum Surfaces and Films, 16(3), 1316–1320.

By: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

Sources: NC State University Libraries, ORCID
Added: August 6, 2018

1998 journal article

Remote plasma-enhanced chemical vapor deposition of SiO2 using Ar/N2O and SiH4

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(11), 3957–3962.

By: C. Courtney n, B. Smith n & H. Lamb n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018