1998 journal article
Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation
Journal of Vacuum Science &Amp; Technology a-Vacuum Surfaces and Films, 16(3), 1316–1320.
Contributors: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, n, H. Lamb n, G. Parsons n
1998 journal article
Remote plasma-enhanced chemical vapor deposition of SiO2 using Ar/N2O and SiH4
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(11), 3957–3962.
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