Clay Henry Courtney

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 16(3 pt.1), 1316–1320.

Remote plasma-enhanced chemical vapor deposition of SiO2 using Ar/N2O and SiH4

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(11), 3957–3962.