Clay Henry Courtney

Smith, L. L., Read, W. W., Yang, C. S., Srinivasan, E., Courtney, C. H., Lamb, H. H., & Parsons, G. N. (1998). Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation. Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 16(3 pt.1), 1316–1320. https://doi.org/10.1116/1.581144

Courtney, C. H., Smith, B. C., & Lamb, H. H. (1998). Remote plasma-enhanced chemical vapor deposition of SiO2 usingAr/N2O and SiH4. Journal of the Electrochemical Society, 145(11), 3957–3962. https://doi.org/10.1149/1.1838898