Works (4)

Updated: April 11th, 2023 10:13

2001 journal article

Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon

APPLIED SURFACE SCIENCE, 181(1-2), 78–93.

By: J. Chambers, B. Busch*, W. Schulte*, T. Gustafsson*, E. Garfunkel*, S. Wang n, D. Maher, T. Klein, G. Parsons

author keywords: X-ray photoelectron spectroscopy; transmission electron microscopy; capacitance-voltage curve
Source: Web Of Science
Added: August 6, 2018

1999 journal article

Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)

APPLIED PHYSICS LETTERS, 75(25), 4001–4003.

By: T. Klein, D. Niu, W. Epling n, W. Li, D. Maher, C. Hobbs*, R. Hegde*, I. Baumvol*, G. Parsons

Source: Web Of Science
Added: August 6, 2018

1999 article

Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 17, pp. 108–112.

By: T. Klein, T. Anderson, A. Chowdhury & G. Parsons

Source: Web Of Science
Added: August 6, 2018

1998 article

Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 16, pp. 1852–1856.

By: A. Chowdhury, T. Klein, T. Anderson & G. Parsons

Source: Web Of Science
Added: August 6, 2018