2001 journal article

Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon

Applied Surface Science, 181(1-2), 78–93.

By: J. Chambers, B. Busch, W. Schulte, T. Gustafsson, E. Garfunkel, S. Wang, D. Maher, T. Klein, G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2o3 thin films on Si(100)

Applied Physics Letters, 75(25), 4001–4003.

By: T. Klein, D. Niu, W. Epling, W. Li, D. Maher, C. Hobbs, R. Hegde, I. Baumvol, G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 17(1), 108–112.

By: T. Klein, T. Anderson, A. Chowdhury & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 16(3 pt.2), 1852–1856.

By: A. Chowdhury, T. Klein, T. Anderson & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018