2001 journal article
Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon
APPLIED SURFACE SCIENCE, 181(1-2), 78–93.
Contributors: J. Chambers n, B. Busch*, W. Schulte*, T. Gustafsson*, E. Garfunkel*, S. Wang n, D. Maher n, *, G. Parsons n
1999 journal article
Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
APPLIED PHYSICS LETTERS, 75(25), 4001–4003.
Contributors: n, D. Niu n, W. Epling n, W. Li n, D. Maher n, C. Hobbs*, R. Hegde*, I. Baumvol*, G. Parsons n
1999 article
Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 17, pp. 108–112.
Contributors: n, T. Anderson n, A. Chowdhury n & G. Parsons n
1998 article
Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 16, pp. 1852–1856.
Contributors: A. Chowdhury n, n, T. Anderson n & G. Parsons n
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