Works (4)
2001 article
Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon
Chambers, J. J., Busch, B. W., Schulte, W. H., Gustafsson, T., Garfunkel, E., Wang, S., … Parsons, G. N. (2001, September 1). Applied Surface Science, Vol. 181, pp. 78–93.
Contributors: J. Chambers n, B. Busch*, W. Schulte*, T. Gustafsson*, E. Garfunkel *, S. Wang n, D. Maher n, *, G. Parsons n
1999 article
Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
Klein, T. M., Niu, D., Epling, W. S., Li, W., Maher, D. M., Hobbs, C. C., … Parsons, G. N. (1999, December 20). Applied Physics Letters, Vol. 75, pp. 4001–4003.
Contributors: n, D. Niu n, W. Epling n, W. Li n, D. Maher n, C. Hobbs*, R. Hegde*, I. Baumvol*, G. Parsons n
1999 article
Hydrogenated silicon nitride thin films deposited between 50 and 250 °C using nitrogen/silane mixtures with helium dilution
Klein, T. M., Anderson, T. M., Chowdhury, A. I., & Parsons, G. N. (1999, January 1). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Vol. 17, pp. 108–112.
Contributors: n, T. Anderson n, A. Chowdhury n & G. Parsons n
1998 article
Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy
Chowdhury, A. I., Klein, T. M., Anderson, T. M., & Parsons, G. N. (1998, May 1). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Vol. 16, pp. 1852–1856.
Contributors: A. Chowdhury n, n, T. Anderson n & G. Parsons n