2001 journal article
Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon
Applied Surface Science, 181(1-2), 78–93.
1999 journal article
Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 17(1), 108–112.
1998 journal article
Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 16(3 pt.2), 1852–1856.