Tonya M. Klein

Chambers, J. J., Busch, B. W., Schulte, W. H., Gustafsson, T., Garfunkel, E., Wang, S., … Parsons, G. N. (2001). Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon. APPLIED SURFACE SCIENCE, 181(1-2), 78–93. https://doi.org/10.1016/S0169-4332(01)00373-7

Klein, T. M., Niu, D., Epling, W. S., Li, W., Maher, D. M., Hobbs, C. C., … Parsons, G. N. (1999). Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100). APPLIED PHYSICS LETTERS, 75(25), 4001–4003. https://doi.org/10.1063/1.125519

Klein, T. M., Anderson, T. M., Chowdhury, A. I., & Parsons, G. N. (1999). Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 17, pp. 108–112. https://doi.org/10.1116/1.582104

Chowdhury, A. I., Klein, T. M., Anderson, T. M., & Parsons, G. N. (1998). Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 16, pp. 1852–1856. https://doi.org/10.1116/1.581117