Works (5)

2006 journal article

Influence of oxygen diffusion through capping layers of low work function metal gate electrodes

IEEE Electron Device Letters, 27(4), 228–230.

By: B. Chen, R. Jha, H. Lazar, N. Biswas, J. Lee, B. Lee, L. Wielunski, E. Garfunkel, V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Electrical characteristics of HfO2 dielectrics with Ru metal gate electrodes

Journal of the Electrochemical Society, 152(9), F138–141.

By: Y. Suh, H. Lazar, B. Chen, J. Lee & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2002 journal article

Electrical properties of Ru-based alloy gate electrodes for dual metal gate Si-CMOS

IEEE Electron Device Letters, 23(6), 354–356.

By: V. Misra, H. Zhong & H. Lazar

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

Characteristics of metalorganic remote plasma chemical vapor deposited Al2O3 gate stacks on SiC metal-oxide-semiconductor devices

Applied Physics Letters, 79(7), 973–975.

By: H. Lazar, V. Misra, R. Johnson & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

1999 journal article

Interfacial properties of ultrathin pure silicon nitride formed by remote plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 17(4), 1836–1839.

By: V. Misra, H. Lazar, Z. Wang, Y. Wu, H. Niimi, G. Lucovsky, J. Wortman, J. Hauser

Source: NC State University Libraries
Added: August 6, 2018