Works (5)

Updated: July 5th, 2023 16:02

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(11), 4333–4341.

By: R. Soman n, A. Reisman n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(11), 4342–4344.

By: R. Soman n, A. Reisman n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(5), 1847–1853.

By: R. Soman n, A. Reisman n, D. Temple n & R. Alberti

Source: Web Of Science
Added: August 6, 2018

2000 journal article

Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(5), 1854–1858.

By: R. Soman n, A. Reisman n, D. Temple n, R. Alberti & C. Pace*

Source: Web Of Science
Added: August 6, 2018

1999 journal article

An alternative derivation for the equilibrium constant of binary solid solution-vapor systems

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(10), 3817–3818.

By: R. Soman n, A. Reisman n & D. Temple n

Source: Web Of Science
Added: August 6, 2018

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