Works (5)
Updated: July 5th, 2023 16:02
2000 journal article
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(11), 4333–4341.
Source: Web Of Science
Added: August 6, 2018
2000 journal article
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(11), 4342–4344.
Source: Web Of Science
Added: August 6, 2018
2000 journal article
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(5), 1847–1853.
Source: Web Of Science
Added: August 6, 2018
2000 journal article
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 147(5), 1854–1858.
jes.ecsdl.org (publisher PDF)
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Source: Web Of Science
Added: August 6, 2018
1999 journal article
An alternative derivation for the equilibrium constant of binary solid solution-vapor systems
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(10), 3817–3818.
Source: Web Of Science
Added: August 6, 2018
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