Ravindra G. Soman

Selective Area Chemical Vapor Deposition of Si[sub 1−x]Ge[sub x] Thin Film Alloys by the Alternating Cyclic Method: A Thermodynamic Analysis. I. The System Si-Ge-Cl-H

Soman, R., Reisman, A., & Temple, D. (2000, January 1). Journal of The Electrochemical Society.

Selective Area Chemical Vapor Deposition of Si[sub 1−x]Ge[sub x] Thin Film Alloys by the Alternating Cyclic Method: A Thermodynamic Analysis. II. The System Si-Ge-Cl-H-Ar

Soman, R., Reisman, A., & Temple, D. (2000, January 1). Journal of The Electrochemical Society.

Selective Area Chemical Vapor Deposition of Si[sub 1−x]Ge[sub x] Thin Film Alloys by the Alternating Cyclic Method: Experimental Data: I. Deposition Parameters

Soman, R., Reisman, A., Temple, D., & Alberti, R. (2000, January 1). Journal of The Electrochemical Society.

Selective Area Chemical Vapor Deposition of Si[sub 1−x]Ge[sub x] Thin Film Alloys by the Alternating Cyclic Method: Experimental Data: II. Morphology and Composition as a Function of Deposition Parameters

Soman, R., Reisman, A., Temple, D., Alberti, R., & Pace, C. (2000, January 1). Journal of The Electrochemical Society.

An Alternative Derivation for the Equilibrium Constant of Binary Solid Solution‐Vapor Systems

Soman, R., Reisman, A., & Temple, D. (1999, October 1). Journal of The Electrochemical Society.