Klaus Flock

Integrated rotating-compensator polarimeter for real-time measurements and analysis of organometallic chemical vapor deposition

Flock, K., Kim, S. J., Asar, M., Kim, I. K., & Aspnes, D. E. (2004, May 1). THIN SOLID FILMS, Vol. 455, pp. 639–644.

Real-time characterization of GaSb homo- and heteroepitaxy

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 22, pp. 2233–2239.

The simultaneous determination of n, k, and t from polarimetric data

Flock, K. (2004, May 1). THIN SOLID FILMS, Vol. 455, pp. 349–355.

Pseudodielectric function of ZnGeP2 from 1.5 to 6 eV

APPLIED PHYSICS LETTERS, 81(4), 628–630.

Investigation and control of MOVPE growth by combined spectroscopic ellipsometry and reflectance-difference spectroscopy

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 184(1), 79–87.

In situ monitoring of MOVPE growth by combined spectroscopic ellipsometry and reflectance-difference spectroscopy

Ebert, M., Bell, K. A., Yoo, S. D., Flock, K., & Aspnes, D. E. (2000, March 27). THIN SOLID FILMS, Vol. 364, pp. 22–27.

Real-time optical characterization of heteroepitaxy by organometallic chemical vapor deposition

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, Vol. 18, pp. 1184–1189.

Real-time optical techniques and QMS to characterize growth in a modified commercial OMVPE reactor

Bell, K. A., Ebert, M., Yoo, S. D., Flock, K., & Aspnes, D. E. (2000, January). JOURNAL OF ELECTRONIC MATERIALS, Vol. 29, pp. 106–111.