2002 journal article
Comparison of secondary ion mass spectroscopy analysis of ultrashallow phosphorus using Cs+, O-2(+), and CsC6- primary ion beams
Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 20(2), 507–511.
Optimization of SIMS analysis conditions for ultra-shallow phosphorus and arsenic implants
In Microbeam Analysis 2000: proceedings of the Second Conference of the International Union of Microbeam Analysis Societies held in Kailua-Kona, Hawaii, 9-14 July 2000 (Vol. 165, pp. 327–328). Bristol: Institute of Physics Publishing.
2000 journal article
Secondary ion mass spectrometry depth profiling of ultrashallow phosphorous in silicon
Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 18(1), 509–513.