Works (4)
Updated: July 5th, 2023 16:01
2002 journal article
Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 20(6), 1989–1996.
UN Sustainable Development Goal Categories
6. Clean Water and Sanitation
(OpenAlex)
Source: Web Of Science
Added: August 6, 2018
2002 journal article
Reaction pathways in remote plasma nitridation of ultrathin SiO2 films
JOURNAL OF APPLIED PHYSICS, 91(1), 48–55.
UN Sustainable Development Goal Categories
7. Affordable and Clean Energy
(OpenAlex)
Source: Web Of Science
Added: August 6, 2018
2001 journal article
Nitrogen incorporation in ultrathin gate dielectrics: A comparison of He/N2O and He/N-2 remote plasma processes
JOURNAL OF APPLIED PHYSICS, 90(6), 3100–3108.
Source: Web Of Science
Added: August 6, 2018
2000 article
Ar/N2O remote plasma-assisted oxidation of Si(100): Plasma chemistry, growth kinetics, and interfacial reactions
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 18, pp. 1757–1763.
Source: Web Of Science
Added: August 6, 2018
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