Works (4)

2002 journal article

Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 20(6), 1989–1996.

By: A. Khandelwal, H. Niimi, G. Lucovsky & H. Lamb

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

Nitrogen incorporation in ultrathin gate dielectrics: A comparison of He/N2O and He/N-2 remote plasma processes

Journal of Applied Physics, 90(6), 3100–3108.

By: A. Khandelwal, B. Smith & H. Lamb

Source: NC State University Libraries
Added: August 6, 2018

2001 journal article

Reaction pathways in remote plasma nitridation of ultrathin SiO2 films

Journal of Applied Physics, 91(1), 48–55.

By: H. Niimi, A. Khandelwal, H. Lamb & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

2000 journal article

Ar/N2O remote plasma-assisted oxidation of Si(100): Plasma chemistry, growth kinetics, and interfacial reactions

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 18(3), 1757–1763.

By: B. Smith, A. Khandelwal & H. Lamb

Source: NC State University Libraries
Added: August 6, 2018