Amit Khandelwal

Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 20(6), 1989–1996.

Reaction pathways in remote plasma nitridation of ultrathin SiO2 films

JOURNAL OF APPLIED PHYSICS, 91(1), 48–55.

Nitrogen incorporation in ultrathin gate dielectrics: A comparison of He/N2O and He/N-2 remote plasma processes

JOURNAL OF APPLIED PHYSICS, 90(6), 3100–3108.

Ar/N2O remote plasma-assisted oxidation of Si(100): Plasma chemistry, growth kinetics, and interfacial reactions

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 18, pp. 1757–1763.