2001 journal article

Recent progress in electron-beam resists for advanced mask-making

IBM Journal of Research and Development, 45(5), 639–650.

By: D. Medeiros, A. Aviram, C. Guarnieri, W. Huang, R. Kwong, C. Magg, A. Mahorowala, W. Moreau, K. Petrillo, M. Angelopoulos

Source: NC State University Libraries
Added: August 6, 2018