2001 journal article

Recent progress in electron-beam a resists for advanced mask-making

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 45(5), 639–650.

By: D. Medeiros*, A. Aviram*, C. Guarnieri n, W. Huang*, R. Kwong*, C. Magg*, A. Mahorowala*, W. Moreau*, K. Petrillo*, M. Angelopoulos*

UN Sustainable Development Goal Categories
Source: Web Of Science
Added: August 6, 2018

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