C. Richard Guarnieri

Medeiros, D. R., Aviram, A., Guarnieri, C. R., Huang, W. S., Kwong, R., Magg, C. K., … Angelopoulos, M. (2001). Recent progress in electron-beam a resists for advanced mask-making. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 45(5), 639–650. https://doi.org/10.1147/rd.455.0639