2005 journal article

Electrical characteristics of HfO2 dielectrics with Ru metal gate electrodes

Journal of the Electrochemical Society, 152(9), F138–141.

By: Y. Suh, H. Lazar, B. Chen, J. Lee & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Physical and electrical analysis of RuxYy alloys for gate electrode applications

Applied Physics Letters, 86(5).

By: B. Chen, Y. Suh, J. Lee, J. Gurganus, V. Misra & C. Cabral

Source: NC State University Libraries
Added: August 6, 2018

2004 journal article

Characteristics of TaSixNy thin films as gate electrodes for dual gate Si-complementary metal-oxide-semiconductor devices

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 22(1), 175–179.

By: Y. Suh, G. Heuss & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2004 journal article

Investigation of stress behaviors and mechanism of void formation in sputtered TiSix films

Thin Solid Films, 450(2), 341–345.

By: Y. Suh, D. Park & S. Jang

Source: NC State University Libraries
Added: August 6, 2018

2003 journal article

Effect of the composition on the electrical properties of TaSixNy metal gate electrodes

IEEE Electron Device Letters, 24(7), 439–441.

By: Y. Suh, G. Heuss, J. Lee & V. Misra

Source: NC State University Libraries
Added: August 6, 2018

2003 journal article

Thermal stability of TaSixNy films deposited by reactive sputtering on SiO2

Journal of the Electrochemical Society, 150(5), F79–82.

By: Y. Suh, G. Heuss, V. Misra, D. Park & K. Limb

Source: NC State University Libraries
Added: August 6, 2018

2002 journal article

Electrical characteristics of TaSixNy/SO2/Si structures by Fowler-Nordheim current analysis

Applied Physics Letters, 80(8), 1403–1405.

By: Y. Suh, G. Heuss & V. Misra

Source: NC State University Libraries
Added: August 6, 2018