2007 journal article
In situ Auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces
LANGMUIR, 23(11), 6106–6112.
2006 journal article
Charge generation during oxidation of thin Hf metal films on silicon
THIN SOLID FILMS, 513(1-2), 201–205.
2003 journal article
Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon
JOURNAL OF APPLIED PHYSICS, 93(3), 1691–1696.