2007 journal article

In situ Auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces

Langmuir, 23(11), 6106–6112.

By: K. Park, D. Terry, S. Stewart & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2006 journal article

Charge generation during oxidation of thin Hf metal films on silicon

Thin Solid Films, 513(1-2), 201–205.

By: T. Gougousi, D. Terry & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

2003 journal article

Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon

Journal of Applied Physics, 93(3), 1691–1696.

By: T. Gougousi, M. Kelly, D. Terry & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018