David B. Terry

Park, K. J., Terry, D. B., Stewart, S. M., & Parsons, G. N. (2007). In situ Auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces. LANGMUIR, 23(11), 6106–6112. https://doi.org/10.1021/la061898u

Gougousi, T., Terry, D. B., & Parsons, G. N. (2006). Charge generation during oxidation of thin Hf metal films on silicon. THIN SOLID FILMS, 513(1-2), 201–205. https://doi.org/10.1016/j.tsf.2006.02.004

Gougousi, T., Kelly, M. J., Terry, D. B., & Parsons, G. N. (2003). Properties of La-silicate high-K dielectric films formed by oxidation of La on silicon. JOURNAL OF APPLIED PHYSICS, 93(3), 1691–1696. https://doi.org/10.1063/1.1531818