Works (6)

Updated: July 5th, 2023 16:04

1998 journal article

Hydrogen abstraction kinetics and crystallization in low temperature plasma deposition of silicon

APPLIED PHYSICS LETTERS, 72(4), 456–458.

By: E. Srinivasan n & G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: E. Srinivasan n & G. Parsons n

Sources: Web Of Science, ORCID
Added: August 6, 2018

1998 journal article

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science &Amp; Technology a-Vacuum Surfaces and Films, 16(3), 1316–1320.

By: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

Sources: NC State University Libraries, ORCID
Added: August 6, 2018

1998 journal article

Self-aligned gate and source drain contacts in inverted-staggered a-Si : H thin-film transistors fabricated using selective area silicon PECVD

IEEE ELECTRON DEVICE LETTERS, 19(6), 180–182.

By: C. Yang n, W. Read n, C. Arthur n, E. Srinivasan n & G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: C. Yang n, W. Read n, C. Arthur n, E. Srinivasan n & G. Parsons n

Sources: Web Of Science, ORCID
Added: August 6, 2018

1997 journal article

Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 15(1), 77–84.

By: E. Srinivasan n, D. Lloyd n & G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: E. Srinivasan n, D. Lloyd n & G. Parsons n

Sources: Web Of Science, ORCID
Added: August 6, 2018

1997 journal article

Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline silicon

JOURNAL OF APPLIED PHYSICS, 81(6), 2847–2855.

By: E. Srinivasan n & G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: E. Srinivasan n & G. Parsons n

Sources: Web Of Science, ORCID
Added: August 6, 2018

1997 journal article

Investigation of substrate dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy

JOURNAL OF APPLIED PHYSICS, 82(12), 6041–6046.

By: L. Smith n, E. Srinivasan n & G. Parsons n

co-author countries: United States of America 🇺🇸

Contributors: L. Smith n, E. Srinivasan n & G. Parsons n

Sources: Web Of Science, ORCID
Added: August 6, 2018

Citation Index includes data from a number of different sources. If you have questions about the sources of data in the Citation Index or need a set of data which is free to re-distribute, please contact us.

Certain data included herein are derived from the Web of Science© and InCites© (2024) of Clarivate Analytics. All rights reserved. You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.