1998 journal article

Hydrogen abstraction kinetics and crystallization in low temperature plasma deposition of silicon

Applied and Environmental Microbiology, 72(4), 456–458.

By: E. Srinivasan & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 16(3 pt.1), 1316–1320.

By: L. Smith, W. Read, C. Yang, E. Srinivasan, C. Courtney, H. Lamb, G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Self-aligned gate and source drain contacts in inverted-staggered a-Si:H thin-film transistors fabricated using selective area silicon PECVD

IEEE Electron Device Letters, 19(6), 180–182.

By: C. Yang, W. Read, C. Arthur, E. Srinivasan & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1997 journal article

Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 15(1), 77–84.

By: E. Srinivasan, D. Lloyd & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1997 journal article

Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline silicon

Journal of Applied Physics, 81(6), 2847–2855.

By: E. Srinivasan & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1997 journal article

Investigation of substrate dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy

Journal of Applied Physics, 82(12), 6041–6046.

By: L. Smith, E. Srinivasan & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018