Easwar Srinivasan

Srinivasan, E., & Parsons, G. N. (1998). Hydrogen abstraction kinetics and crystallization in low temperature plasma deposition of silicon. APPLIED PHYSICS LETTERS, 72(4), 456–458. https://doi.org/10.1063/1.120785

Smith, L. L., Read, W. W., Yang, C. S., Srinivasan, E., Courtney, C. H., Lamb, H. H., & Parsons, G. (1998). Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation. Journal of Vacuum Science  Technology a-Vacuum Surfaces and Films, 16(3), 1316–1320. https://doi.org/10.1116/1.581144

Yang, C. S., Read, W. W., Arthur, C., Srinivasan, E., & Parsons, G. N. (1998). Self-aligned gate and source drain contacts in inverted-staggered a-Si : H thin-film transistors fabricated using selective area silicon PECVD. IEEE ELECTRON DEVICE LETTERS, 19(6), 180–182. https://doi.org/10.1109/55.678536

Srinivasan, E., Lloyd, D. A., & Parsons, G. N. (1997). Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 15(1), 77–84. https://doi.org/10.1116/1.580480

Srinivasan, E., & Parsons, G. N. (1997). Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline silicon. JOURNAL OF APPLIED PHYSICS, 81(6), 2847–2855. https://doi.org/10.1063/1.364309

Smith, L. L., Srinivasan, E., & Parsons, G. N. (1997). Investigation of substrate dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy. JOURNAL OF APPLIED PHYSICS, 82(12), 6041–6046. https://doi.org/10.1063/1.366471