1998 journal article
Analysis of reactor geometry and diluent gas flow effects on the metalorganic vapor phase epitaxy of AlN and GaN thin films on alpha(6H) SiC substrates
Journal of Electronic Materials, 27(4), 238–245.
By: A. Hanser, C. Wolden, W. Perry, T. Zheleva, E. Carlson, A. Banks, R. Therrien, R. Davis
Coalesced oriented diamond films on nickel
Journal of Materials Research, 13(5), 1120–1123.
By: P. Yang, C. Wolden, W. Liu, R. Schlesser, R. Davis, J. Prater, Z. Sitar
Flat-flame diamond CVD: the effect of pressure and operating conditions for specific applications
Diamond and Related Materials, 7(2-5), 133–138.
By: C. Wolden, R. Davis, Z. Sitar & J. Prater
Heteroepitaxial nucleation of diamond on nickel
Diamond and Related Materials, 7(2-5), 276–282.
By: Z. Sitar, W. Liu, P. Yang, C. Wolden, R. Schlesser & J. Prater
Surface melting in the heteroepitaxial nucleation of diamond on Ni
Journal of Crystal Growth, 187(1), 81–88.
By: P. Yang, W. Liu, R. Schlesser, C. Wolden, R. Davis, J. Prater, Z. Sitar
Transmission electron microscoanalysis of the oriented diamond growth on nickel substrates
Journal of Applied Physics, 83(12), 7658–7663.
By: W. Liu, P. Yang, C. Wolden, R. Davis, J. Prater & Z. Sitar
1997 journal article
High rate and selective etching of GaN, AlGaN, and AlN using an inductively coupled plasma
Applied Physics Letters, 71(25), 3631–3633.
By: S. Smith, C. Wolden, M. Bremser, A. Hanser, R. Davis & W. Lampert
Highly oriented diamond deposited using a low pressure flat flame
Materials Letters, 32(1), 9–12.
By: C. Wolden, S. Han, M. McClure, Z. Sitar & J. Prater
In situ mass spectrometry during diamond chemical vapor deposition using a low pressure flat flame
Journal of Materials Research, 12(10), 2733–2742.
Low-temperature deposition of optically transparent diamond using a low-pressure flat flame
Diamond and Related Materials, 6(12), 1862–1867.
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