Kie Jin Park

Works (8)

Updated: July 5th, 2023 15:57

2012 journal article

Atomic layer deposition of Ru onto organic monolayers: Shifting metal effective work function using monolayer structure

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 30(1).

By: K. Park n & G. Parsons n 

Contributors: K. Park n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

2008 journal article

Conformal metal oxide coatings on nanotubes by direct low temperature metal-organic pyrolysis in supercritical carbon dioxide

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 26(3), 978–982.

By: Q. Peng n, J. Spagnola n, H. Daisuke n, K. Park n & G. Parsons n 

Contributors: Q. Peng n, J. Spagnola n, H. Daisuke n, K. Park n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

2008 journal article

Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide

THIN SOLID FILMS, 516(15), 4997–5003.

By: Q. Peng n, D. Hojo n, K. Park* & G. Parsons n 

Contributors: Q. Peng n, D. Hojo n, K. Park* & G. Parsons n 

author keywords: supercritical carbon dioxide (scCO(2)); metal oxides; solvation energy; thermal decomposition; metal diketonates
Sources: Web Of Science, ORCID
Added: August 6, 2018

2007 journal article

Atomic layer deposition of Conformal inorganic nanoscale coatings on three-dimensional natural fiber systems: Effect of surface topology on film growth characteristics

LANGMUIR, 23(19), 9844–9849.

By: G. Hyde n, K. Park n, S. Stewart n, J. Hinestroza  n & G. Parsons n 

Contributors: G. Hyde n, K. Park n, S. Stewart n, J. Hinestroza  n & G. Parsons n 

MeSH headings : Aluminum Oxide / chemistry; Cotton Fiber; Microscopy, Electron, Transmission; Nanotechnology; Surface Properties
TL;DR: The results highlight key concerns for achieving controlled conformal coatings on complex surfaces and open the possibility for new textile finishing approaches to create novel fabric-based materials with specialized function and performance. (via Semantic Scholar)
Sources: Web Of Science, ORCID
Added: August 6, 2018

2007 journal article

In situ Auger electron spectroscopy study of atomic layer deposition: Growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces

LANGMUIR, 23(11), 6106–6112.

By: K. Park n, D. Terry n, S. Stewart n & G. Parsons n 

Contributors: K. Park n, D. Terry n, S. Stewart n & G. Parsons n 

TL;DR: Ruthenium ALD is studied here using ruthenocene and oxygen as reactants, and growth initiation and nucleation are characterized on several different growth surfaces, including SiO 2, HfO2, and hydrogen terminated silicon, using on-line Auger electron spectroscopy and ex-situ X-ray photoelectron spectroscopic. (via Semantic Scholar)
Sources: Web Of Science, ORCID
Added: August 6, 2018

2006 journal article

Selective area atomic layer deposition of rhodium and effective work function characterization in capacitor structures

APPLIED PHYSICS LETTERS, 89(4).

By: K. Park n & G. Parsons n 

Contributors: K. Park n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

2005 journal article

Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition

APPLIED PHYSICS LETTERS, 86(5).

By: K. Park n, J. Doub n, T. Gougousi n & G. Parsons n 

Contributors: K. Park n, J. Doub n, T. Gougousi n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

2004 journal article

Bulk and interface charge in low temperature silicon nitride for thin film transistors on plastic substrates

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22(6), 2256–2260.

By: K. Park n & G. Parsons n 

Contributors: K. Park n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: August 6, 2018

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