Jason M. Doub

Works (1)

Updated: July 5th, 2023 15:57
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2005 journal article

Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition

APPLIED PHYSICS LETTERS, 86(5).

By: K. Park n, J. Doub n, T. Gougousi n & G. Parsons n 

co-author countries: United States of America 🇺🇸

Contributors: K. Park n, J. Doub n, T. Gougousi n & G. Parsons n 

Sources: Web Of Science, ORCID
Added: August 6, 2018