2005 journal article
Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition
APPLIED PHYSICS LETTERS, 86(5).
By: K. Park n, J. Doub n, T. Gougousi n & G. Parsons nβ
Contributors: K. Park n, J. Doub n, T. Gougousi n & G. Parsons nβ