@article{park_doub_gougousi_parsons_2005, title={Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition}, volume={86}, ISSN={["0003-6951"]}, url={http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000227144700016&KeyUID=WOS:000227144700016}, DOI={10.1063/1.1852079}, abstractNote={Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation K. J. Park, J. M. Doub, T. Gougousi, G. N. Parsons; Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition. Appl. Phys. Lett. 31 January 2005; 86 (5): 051903. https://doi.org/10.1063/1.1852079 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioApplied Physics Letters Search Advanced Search |Citation Search}, number={5}, journal={APPLIED PHYSICS LETTERS}, author={Park, KJ and Doub, JM and Gougousi, T and Parsons, GN}, year={2005}, month={Jan} }