Jaehoon Lee

Works (3)

Updated: July 5th, 2023 15:57

2006 article

Influence of oxygen diffusion through capping layers of low work function metal gate electrodes

Chen, N. B., Jha, R., Lazar, H., Biswas, N., Lee, N. J., Lee, N. B., … Misra, V. (2006, April 1). IEEE Electron Device Letters, Vol. 27, pp. 228–230.

By: N. Chen n, R. Jha n, H. Lazar n, N. Biswas n, N. Lee n, N. Lee n, L. Wielunski*, E. Garfunkel *, V. Misra n 

author keywords: alloy; capping; effective work function; metal gate; MoTa; oxygen diffusion
topics (OpenAlex): Semiconductor materials and devices; Ferroelectric and Negative Capacitance Devices; Electronic and Structural Properties of Oxides
Sources: Web Of Science, NC State University Libraries
Added: August 6, 2018

2005 article

Electrical Characteristics of HfO[sub 2] Dielectrics with Ru Metal Gate Electrodes

Suh, Y.-S., Lazar, H., Chen, B., Lee, J.-H., & Misra, V. (2005, January 1). Journal of The Electrochemical Society, Vol. 152, pp. F138–141.

By: Y. Suh n, H. Lazar n, B. Chen  n, J. Lee n & V. Misra n 

topics (OpenAlex): Semiconductor materials and devices; Advancements in Semiconductor Devices and Circuit Design; Ferroelectric and Negative Capacitance Devices
Sources: Web Of Science, NC State University Libraries
Added: August 6, 2018

2005 article

Physical and electrical analysis of RuxYy alloys for gate electrode applications

Chen, B., Suh, Y., Lee, J., Gurganus, J., Misra, V., & Cabral, C. (2005, January 21). Applied Physics Letters, Vol. 86.

By: B. Chen n, Y. Suh n, J. Lee n, J. Gurganus n, V. Misra n  & C. Cabral *

topics (OpenAlex): Semiconductor materials and devices; Surface and Thin Film Phenomena; Electronic and Structural Properties of Oxides
Sources: Web Of Science, NC State University Libraries
Added: August 6, 2018

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