Jon F. Ihlefeld Ihlefeld, J. F., Daniels, P. R., Aygun, S. M., Borland, W. J., & Maria, J.-P. (2010). Property engineering in BaTiO3 films by stoichiometry control. JOURNAL OF MATERIALS RESEARCH, 25(6), 1064–1071. https://doi.org/10.1557/jmr.2010.0151 Borland, W., Burn, I., Ihlefeld, J. F., Maria, J. P., & Suh, S. (2009). Articles comprising manganese doped barium titanate thin film compositions. Borland, W., Burn, I., Ihlefeld, J. F., Maria, J. P., & Suh, S. (2009). Methods of making thin film capacitors comprising a manganese doped barium titantate dielectric. Ihlefeld, J. F., Losego, M. D., Collazo, R., Borland, W. J., & Maria, J.-P. (2008). Defect chemistry of nano-grained barium titanate films. JOURNAL OF MATERIALS SCIENCE, 43(1), 38–42. https://doi.org/10.1007/s10853-007-2135-3 Ihlefeld, J. F., Borland, W. J., & Maria, J. P. (2008). Dielectric and microstructural properties of barium titanate hafhate thin films. Thin Solid Films, 516(10), 3162–3166. https://doi.org/10.1016/j.tsf.2007.08.096 Ihlefeld, J. F., Borland, W. J., & Maria, J.-P. (2008). Enhanced dielectric tunability in barium titanate thin films with boron additions. SCRIPTA MATERIALIA, 58(7), 549–552. https://doi.org/10.1016/j.scriptamat.2007.11.008 Ihlefeld, J. F., Vodnick, A. M., Baker, S. P., Borland, W. J., & Maria, J.-P. (2008). Extrinsic scaling effects on the dielectric response of ferroelectric thin films. JOURNAL OF APPLIED PHYSICS, 103(7). https://doi.org/10.1063/1.2903211 Laughlin, B., Ihlefeld, J. F., Daniels, P., & Maria, J.-P. (2008). Flexible and lithography-compatible copper foil substrates for ferroelectric thin films. THIN SOLID FILMS, 516(10), 3294–3297. https://doi.org/10.1016/j.tsf.2007.08.093 Ihlefeld, J. F., Borland, W. J., & Maria, J.-P. (2008). Synthesis and properties of barium titanate stannate thin films by chemical solution deposition. JOURNAL OF MATERIALS SCIENCE, 43(12), 4264–4270. https://doi.org/10.1007/s10853-008-2618-x Ihlefeld, J. F., Borland, W. J., & Maria, J.-P. (2007). Enhanced Dielectric and Crystalline Properties in Ferroelectric Barium Titanate Thin Films. Advanced Functional Materials, 17(7), 1199–1203. https://doi.org/10.1002/adfm.200601159 Daniels, P., Ihlefeld, J., Borland, W., & Maria, J.-P. (2007). Smart electrodes for ultralarge-area thin film capacitors. JOURNAL OF MATERIALS RESEARCH, 22(7), 1763–1766. https://doi.org/10.1557/JMR.2007.0272 Craft, H. S., Ihlefeld, J. F., Losego, M. D., Collazo, R., Sitar, Z., & Maria, J.-P. (2006). MgO epitaxy on GaN (0002) surfaces by molecular beam epitaxy. APPLIED PHYSICS LETTERS, 88(21). https://doi.org/10.1063/1.2201041 Borland, W. J., Ihlefeld, J. F., Kingon, A. I., & Maria, J. P. (2006). Thin film dielectrics for capacitors and methods of making thereof. Washington, DC: U.S. Patent and Trademark Office. Ihlefeld, J., Laughlin, B., Hunt-Lowery, A., Borland, W., Kingon, A., & Maria, J. P. (2005). Copper compatible barium titanate thin films for embedded passives. JOURNAL OF ELECTROCERAMICS, 14(2), 95–102. https://doi.org/10.1007/s10832-005-0866-6 Ihlefeld, J. F., Maria, J. P., & Borland, W. (2005). Dielectric and microstructural properties of barium titanate zirconate thin films on copper substrates. JOURNAL OF MATERIALS RESEARCH, 20(10), 2838–2844. https://doi.org/10.1557/JMR.2005.0342 Losego, M. D., Jimison, L. H., Ihlefeld, J. F., & Maria, J. P. (2005). Ferroelectric response from lead zirconate titanate thin films prepared directly on low-resistivity copper substrates. APPLIED PHYSICS LETTERS, 86(17). https://doi.org/10.1063/1.1919388 Laughlin, B., Ihlefeld, J., & Maria, J. P. (2005). Preparation of sputtered (Ba-x,Sr1-x)TiO3 thin films directly on copper. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 88(9), 2652–2654. https://doi.org/10.1111/j.1551-2916.2005.00488.x