@article{piner_behbehani_elmasry_mcintosh_roberts_boutros_bedair_1997, title={Effect of hydrogen on the indium incorporation in InGaN epitaxial films}, volume={70}, ISSN={["0003-6951"]}, DOI={10.1063/1.118181}, abstractNote={The InN percent in metalorganic chemical vapor deposition (MOCVD) and atomic layer epitaxy (ALE) grown InGaN was found to be significantly influenced by the amount of hydrogen flowing into the reactor. The temperature ranges for this study are 710–780 °C for MOCVD, and 650–700 °C for ALE. For a given set of growth conditions, an increase of up to 25% InN in InGaN, as determined by x-ray diffraction, can be achieved by reducing the hydrogen flow from 100 to 0 sccm. Additionally, the hydrogen produced from the decomposition of ammonia does not seem to change the InN percent in the films, indicating that the ammonia decomposition rate is less than 0.1%. The phenomenon of having hydrogen control the indium incorporation was not reported in the growth of any other III–V compound previously studied.}, number={4}, journal={APPLIED PHYSICS LETTERS}, author={Piner, EL and Behbehani, MK and ElMasry, NA and McIntosh, FG and Roberts, JC and Boutros, KS and Bedair, SM}, year={1997}, month={Jan}, pages={461–463} }
 @article{bedair_mcintosh_roberts_piner_boutros_elmasry_1997, title={Growth and characterization of In-based nitride compounds}, volume={178}, ISSN={["0022-0248"]}, DOI={10.1016/S0022-0248(97)00069-9}, abstractNote={Development of In-based nitride compounds is lagging behind the corresponding Al- and Ga-based compounds. Potential problems facing the growth of Inx Ga1 − x N films and their double heterostructures will be outlined. A tentative model which describes the reaction pathways taking place during the growth of these In-based nitride compounds is presented and is used to explain both our ALE and MOCVD results. In addition, growth parameters leading to the achievement of high values of x, reduction of In metal incorporation and improvement of both the structural and optical properties of InGaN, AlGaInN and InN will be discussed. Properties of AlGaN/InGaN/AlGaN and AlGaInN/InGaN/AlGaInN double heterostructures will be presented, with emission wavelengths in the 400–550 nm range.}, number={1-2}, journal={JOURNAL OF CRYSTAL GROWTH}, author={Bedair, SM and McIntosh, FG and Roberts, JC and Piner, EL and Boutros, KS and ElMasry, NA}, year={1997}, month={Jun}, pages={32–44} }