1997 journal article
Optimization of process conditions for selective silicon epitaxy using disilane, hydrogen, and chlorine
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144(9), 3309–3315.
1997 journal article
Rapid thermal chemical vapor deposition of in situ boron doped polycrystalline silicon germanium films on silicon dioxide for complimentary metal oxide semiconductor applications
Applied Physics Letters, 71(23), 3388–3390.
