Jerome J Cuomo

Activating the Growth of High Surface Area Alumina Using a Liquid Galinstan Alloy

ACS OMEGA, 3(12), 16409–16415.

Oxygen Reduction on Metal-Free Nitrogen-Doped Carbon Nanowall Electrodes

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 159(11), F733–F742.

Ion beam pretreatment of polymeric substrates for ITO thin film deposition

SOLID STATE SCIENCES, 10(7), 941–949.

A novel technique for processing functionally graded HA coatings

Rabiei, A., Thomas, B., Neville, B., Lee, J. W., & Cuomo, J. (2007, April). MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, Vol. 27, pp. 523–528.

Microstructure, mechanical properties, and biological response to functionally graded HA coatings

Rabiei, A., Blalock, T., Thomas, B., Cuomo, J., Yang, Y., & Ong, J. (2007, April). MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, Vol. 27, pp. 529–533.

A study on functionally graded HA coatings processed using ion beam assisted deposition with in situ heat treatment

SURFACE & COATINGS TECHNOLOGY, 200(20-21), 6111–6116.

Aluminum nitride thin films on an LTCC substrate

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 88(7), 1977–1980.

MIIIN based materials and methods and apparatus for producing same

Washington, DC: U.S. Patent and Trademark Office.

Non-thermionic sputter material transport device, methods of use, and materials produced thereby

Washington, DC: U.S. Patent and Trademark Office.

Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films

Journal of Vacuum Science & Technology A, 22(2), 260–263.

Micro-Raman study of electronic properties of inversion domains in GaN-based lateral polarity heterostructures

JOURNAL OF APPLIED PHYSICS, 93(12), 9542–9547.

Optical and structural studies of hydride vapor phase epitaxy grown GaN

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 21(3), 701–705.

Pattern release film between two laminated surfaces

Washington, DC: U.S. Patent and Trademark Office.

Wavelength-dependent Raman scattering of hydrogenated amorphous silicon carbon with red, green, and blue light excitation

JOURNAL OF MATERIALS RESEARCH, 18(4), 768–771.

Wear-resistant polymeric articles and methods of making the same

Washington, DC: U.S. Patent and Trademark Office.

Modifying nylon and polypropylene fabrics with atmospheric pressure plasmas

TEXTILE RESEARCH JOURNAL, 72(6), 491–498.

X-ray and Raman analyses of GaN produced by ultrahigh-rate magnetron sputter epitaxy

APPLIED PHYSICS LETTERS, 81(10), 1797–1799.

Band gap structure and electron emission property of chemical-vapor-deposited diamond films

SOLID-STATE ELECTRONICS, 45(6), 915–919.

Field emission from ultrathin coatings of AlN on Mo emitters

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19(1), 50–54.

Nondestructive measurement of a glass transition temperature at spin-cast semicrystalline polymer surfaces

MACROMOLECULES, 34(8), 2395–2397.

Optical characterization of wide band gap amorphous semiconductors (a-Si : C : H): Effect of hydrogen dilution

JOURNAL OF APPLIED PHYSICS, 89(2), 1130–1137.

Optimizing high-current yields from diamond coated field emitters

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 19, pp. 17–22.

Effect of Ar+ ion beam in the process of plasma surface modification of PET films

JOURNAL OF APPLIED POLYMER SCIENCE, 77(8), 1679–1683.

Ultrathin DLC and SiOx layer deposition on poly(ethylene terephthalate) and restriction of surface dynamics

Journal of Applied Polymer Science, 75(9), 1158–1164.

Effect of nitrogen incorporation on electron emission from chemical vapor deposited diamond

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 17, pp. 734–739.

Investigation of thickness effects on AlN coated metal tips by in situ I-V measurement

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 17, pp. 632–634.

Raman analysis and field emission study of ion beam etched diamond films

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol. 17, pp. 700–704.

Raman scattering of tetrahedrally-bonded amorphous carbon deposited at oblique angles

MATERIALS LETTERS, 41(5), 229–233.

Electron energy distribution of diamond-coated field emitters

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 16(2), 716–719.

Environmental effect on the electron emission from diamond surfaces

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 16(3), 1188–1193.

Fine structure of near-band-edge photoluminescence in He+-irradiated GaN grown on SiC

APPLIED PHYSICS LETTERS, 72(22), 2838–2840.

Secondary electron emission patterning of diamond with hydrogen and oxygen plasmas

APPLIED PHYSICS LETTERS, 72(20), 2580–2582.

Electron field emission from amorphous carbon-cesium alloys

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, Vol. 15, pp. 1729–1732.

Field emission enhancement from Mo tip emitters coated with N containing amorphous diamond films

Surface & Coatings Technology, 94(1-3), 672–675.

Field emission from amorphous diamond coated Mo tip emitters by pulsed laser deposition

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 15(4), 840–844.

Harnessing reverse annealing phenomenon for shallow p-n junction formation

JOURNAL OF APPLIED PHYSICS, 82(10), 5185–5190.

Low energy ion beam assisted grain size evolution in thin film deposition

Rajan, K., Roy, R., Trogolo, J., & Cuomo, J. J. (1997, November). JOURNAL OF ELECTRONIC MATERIALS, Vol. 26, pp. 1270–1273.

Wide band gap materials for field emission devices

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, Vol. 15, pp. 1733–1738.

Amorphous magnetic thin films with highly stable easy axis

Aboaf, J. A., Cuomo, J. J., Gangulee, A., & Kobliska, R. J. Washington, DC: U.S. Patent and Trademark Office.

Amorphous matrices having dispersed cesium

Cuomo, J. J., & Kim, S. I. Washington, DC: U.S. Patent and Trademark Office.

Amorphous metallic and nitrogen containing alloy films

Cuomo, J. J., Gangulee, A., & Kobliska, J. Washington, DC: U.S. Patent and Trademark Office.

Apparatus and method for generating high current negative ions

Cuomo, J. J., & Kaufman, H. R. Washington, DC: U.S. Patent and Trademark Office.

Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination

Cuomo, J. J., Guarnieri, C. R., & Hopwood, J. A. Washington, DC: U.S. Patent and Trademark Office.

Apparatus for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film

Cuomo, J. J., & Yehoda, J. E. Washington, DC: U.S. Patent and Trademark Office.

Apparatus using amorphous magnetic compositions

Chaudhari, P., Cuomo, J. J., & Gambino, R. J. Washington, DC: U.S. Patent and Trademark Office.

Beam addressable film using amorphous magnetic material

Chaudhari, P., Cuomo, J. J., Gambino, R. J., & McGuire, T. R. Washington, DC: U.S. Patent and Trademark Office.

Compact plug connectable ion source

Cuomo, J. J., Harper, J. M., & Kaufman, H. R. Washington, DC: U.S. Patent and Trademark Office.

Copper texturing process

Cuomo, J. J., Leary, P. A., & Yee, D. S. Washington, DC: U.S. Patent and Trademark Office.

Durable optical elements fabricated from free standing polycrystalline diamond and non-hydrogenated amorphous diamond like carbon (DLC) thin films

Cuomo, J. J., Guarnieri, C. R., Hoenig, B. A., Seki, H., Speidell, J. L., & Whitehair, S. J. Washington, DC: U.S. Patent and Trademark Office.

Electron source

Cuomo, J. J., Dreyfus, R. W., & Woodall, J. M. Washington, DC: U.S. Patent and Trademark Office.

Electrostatic clutch

Cuomo, J. J., Landon, A. J., & Wang, H. C. Washington, DC: U.S. Patent and Trademark Office.

Energetic particle beam deposition system

Cuomo, J. J., Gambino, R. J., Harper, J. M., & Kuptis, J. D. Washington, DC: U.S. Patent and Trademark Office.

Etching by sputtering from an intermetallic target to form negative metallic ions which produce etching of a juxtaposed substrate

Cuomo, J. J., Gambino, R. J., & Harper, J. M. Washington, DC: U.S. Patent and Trademark Office.

Force sensitive transducer for use in a computer keyboard

Cali, M. F., Cuomo, J. J., Mikalsen, D. J., Rutledge, J. D., & Selker, E. J. Washington, DC: U.S. Patent and Trademark Office.

Growth of polycrystalline semiconductor film with intermetallic nucleating layer

Cuomo, J. J., DiStefano, T. H., & Rosenberg, R. Washington, DC: U.S. Patent and Trademark Office.

Hall ion generator for working surfaces with a low energy high intensity ion beam

Cuomo, J. J., & Kaufman, H. R. Washington, DC: U.S. Patent and Trademark Office.

High intensity ion source using ionic conductors

Chandrashekhar, G. V., Chaudhari, P., Cuomo, J. J., Gambino, R. J., & Harper, J. M. Washington, DC: U.S. Patent and Trademark Office.

Hollow cathode

Cuomo, J. J., Kaufman, H. R., & Rossnagel, S. M. Washington, DC: U.S. Patent and Trademark Office.

Hollow cathode enhanced magnetron sputter device

Cuomo, J. J., Kafuman, H. R., & Rossnagel, S. M. Washington, DC: U.S. Patent and Trademark Office.

Hollow cathode enhanced plasma for high rate reactive ion etching and deposition

Bumble, B., Cuomo, J. J., Logan, J. S., & Rossnagel, S. M. Washington, DC: U.S. Patent and Trademark Office.

Low contact electrical resistant composition, substrates coated therewith, and process for preparing such

Cuomo, J. J., Dibble, E. P., & Levine, S. L. Washington, DC: U.S. Patent and Trademark Office.

Low energy ion beam oxidation process

Cuomo, J. J., & Harper, J. M. Washington, DC: U.S. Patent and Trademark Office.

Method and apparatus for contamination control in processing apparatus containing voltage driven electrode

Cuomo, J. J., Grazioso, M. V., Guarnieri, C. R., Haller, K. L., Heidenreich, J. E., Selwyn, G. S., & Whitehair, S. J. Washington, DC: U.S. Patent and Trademark Office.

Method and apparatus for producing MIIIN columns and MIIIN materials grown thereon

Cuomo, J. J., Williams, N. M., Hanser, A. D., Carlson, E. P., & Thomas, D. T. Washington, DC: U.S. Patent and Trademark Office.

Method for enhanced inductive coupling to plasmas with reduced sputter contamination

Cuomo, J. J., Guarnieri, C. R., & Hopwood, J. A. Washington, DC: U.S. Patent and Trademark Office.

Method for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film

Cuomo, J. J., & Yehoda, J. E. Washington, DC: U.S. Patent and Trademark Office.

Method for preparing large single crystal thin films

Chaudhari, P., Cuomo, J. J., & Matthews, J. W. Washington, DC: U.S. Patent and Trademark Office.

Method of fabricating nendritic materials

Bindra, P. S., Cuomo, J. J., Gall, T. P., Ingraham, A. P., Kang, S. K., Kim, J., … Walker, G. F. Washington, DC: U.S. Patent and Trademark Office.

Method of preparing oriented, polycrystalline superconducting ceramic oxides

Cuomo, J. J., Guarnieri, C. R., Machlin, E. S., Roy, R. A., & Yee, D. S. Washington, DC: U.S. Patent and Trademark Office.

Microwave processing

Cuomo, J. J., Gelmore, J. D., Hatzakis, M., Lewis, D. A., Shaw, J. M., & Whitehair, S. J. Washington, DC: U.S. Patent and Trademark Office.

Microwave processing

Cuomo, J. J., Gelorme, J. D., Hatzakis, M., Lewis, D. A., Shaw, J. M., & Whitehair, S. J. Washington, DC: U.S. Patent and Trademark Office.

Negative ion beam selective etching process

Cuomo, J. J. Washington, DC: U.S. Patent and Trademark Office.

Photoelectric enhanced plasma glow discharge system and method including radiation means

Cuomo, J. J., & Guarnieri, C. R. Washington, DC: U.S. Patent and Trademark Office.

Photon energy conversion

Cuomo, J. J., DiStefano, T. H., & Woodall, J. M. Washington, DC: U.S. Patent and Trademark Office.

Photon energy converter

Cuomo, J. J., Woodall, J. M., & Ziegler, J. F. Washington, DC: U.S. Patent and Trademark Office.

Plasma enhanced chemical vapor processing system using hollow cathode effect

Blum, J. M., Bumble, B., Chan, K. K., Conde, J. R., Cuomo, J. J., & Kane, W. F. Washington, DC: U.S. Patent and Trademark Office.

Process for fabricating high density disc storage device

Brezoczky, B., Cuomo, J. J., Guarnieri, C. R., Ramanathan, K. V., Shivashankar, S. A., Smith, D. A., & Yee, D. S. Washington, DC: U.S. Patent and Trademark Office.

Process for preparing low electrical contact resistance composition

Cuomo, J. J., Dibble, E. P., & Levine, S. L. Washington, DC: U.S. Patent and Trademark Office.

Process for producing aluminum alkoxide or aluminum aryloxide

Cuomo, J. J., Leary, P. A., & Woodall, J. M. Washington, DC: U.S. Patent and Trademark Office.

Process of making a radiation responsive device

Cuomo, J. J., DiStefano, T. H., & Rosenberg, R. Washington, DC: U.S. Patent and Trademark Office.

Programmable ion beam patterning system

Cuomo, J. J., Harper, J. M., Kafuman, H. R., & Speidell, J. L. Washington, DC: U.S. Patent and Trademark Office.

Radiation responsive device

Cuomo, J. J., DiStefano, T. H., & Rosenberg, R. Washington, DC: U.S. Patent and Trademark Office.

Radio frequency induction plasma processing system utilizing a uniform field coil

Cuomo, J. J., Guarnieri, C. R., Hopwood, J. A., & Whitehair, S. J. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. Washington, DC: U.S. Patent and Trademark Office.

Selective deposition process for physical vapor deposition

Berry, C. J., Cuomo, J. J., Guarnieri, C. R., & Yee, D. S. Washington, DC: U.S. Patent and Trademark Office.

Separable electrical connection technology

Bindra, P. S., Cuomo, J. J., Gall, T. P., Ingraham, A. P., Kang, S. K., Kim, J., … Walker, G. F. Washington, DC: U.S. Patent and Trademark Office.

Single grid focussed ion beam source

Cuomo, J. J., Harper, J. M., & Waters, G. A. Washington, DC: U.S. Patent and Trademark Office.

Solid state ionic polishing of diamond

Cuomo, J. J., & Yehoda, J. E. Washington, DC: U.S. Patent and Trademark Office.

Solid state microwave powered material and plasma processing systems

Cuomo, J. J., Guarnieri, C. R., & Whitehair, S. Washington, DC: U.S. Patent and Trademark Office.

Solid state renewable energy supply

Cuomo, J. J., & Woodall, J. M. Washington, DC: U.S. Patent and Trademark Office.

Spherical retarding grid analyzer

Clark, G. J., Chaundhari, P., Cuomo, J. J., Frisch, M. A., & Speidell, J. L. Washington, DC: U.S. Patent and Trademark Office.

Sub 100A range line width pattern fabrication

Broers, A. N., Cuomo, J. J., Laibowitz, R. B., & Molzen, W. W. Washington, DC: U.S. Patent and Trademark Office.

Sub-100A range line width pattern fabrication

Broers, A. N., Cuomo, J. J., Laibowitz, R. B., & Moltzen, W. W. Washington, DC: U.S. Patent and Trademark Office.

Surface treatment effects on the electron emission characteristics of ultra thin AlN coated molybdenum tips

Kang, D., & Cuomo, J. J. Journal of Ceramic Processing Research, 3(3), 228–230.

System and method for deflecting and focusing a broad ion beam

Cuomo, J. J., & Harper, J. M. Washington, DC: U.S. Patent and Trademark Office.

Ultrasonic micro machining slider air bearings with diamond faced patterned die

Cuomo, J. J., Kerth, R. T., & Major, J. C. Washington, DC: U.S. Patent and Trademark Office.