David Brian Aldrich

Works (2)

Updated: July 5th, 2023 16:04

1999 article

Hydrogen Plasma Removal of Post‐RIE Residue for Backend Processing

Somashekhar, A., Ying, H., Smith, P. B., Aldrich, D. B., & Nemanich, R. J. (1999, June 1). Journal of The Electrochemical Society.

By: A. Somashekhar n, H. Ying  n, P. Smith*, D. Aldrich* & R. Nemanich n

topics (OpenAlex): Semiconductor materials and devices; Integrated Circuits and Semiconductor Failure Analysis; Advancements in Semiconductor Devices and Circuit Design
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Source: Web Of Science
Added: August 6, 2018

1997 article

Electrical and structural properties of zirconium germanosilicide formed by a bilayer solid state reaction of Zr with strained Si1−xGex alloys

Wang, Z., Aldrich, D. B., Nemanich, R. J., & Sayers, D. E. (1997, September 1). Journal of Applied Physics.

By: Z. Wang n, D. Aldrich n, R. Nemanich n & D. Sayers n

topics (OpenAlex): Semiconductor materials and interfaces; Intermetallics and Advanced Alloy Properties; Microstructure and mechanical properties
Source: Web Of Science
Added: August 6, 2018

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