Christian Hopfner

Works (4)

Updated: April 11th, 2023 10:13
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1999 journal article

Optimal design of a high pressure organometallic chemical vapor deposition reactor

MATHEMATICAL AND COMPUTER MODELLING, 29(8), 65–80.

By: K. Bachmann, H. Banks, C. Hopfner, G. Kepler, S. LeSure, S. McCall, J. Scroggs

Source: Web Of Science
Added: August 6, 2018

1998 journal article

Real-time monitoring of steady-state pulsed chemical beam epitaxy by p-polarized reflectance

JOURNAL OF CRYSTAL GROWTH, 183(3), 323–337.

By: K. Bachmann, N. Sukidi, C. Hopfner, C. Harris, N. Dietz, H. Tran , S. Beeler, K. Ito, H. Banks

author keywords: p-polarized reflectance; surface kinetics; chemical beam epitaxy; real-time process monitoring
Sources: Web Of Science, ORCID
Added: August 6, 2018

1998 journal article

Simulation of a vertical reactor for high pressure organometallic chemical vapor deposition

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 57(1), 9–17.

By: G. Kepler, C. Hopfner, J. Scroggs & K. Bachmann

author keywords: organometallic chemical vapor deposition; above-atmosphere pressure; numerical simulation; vertical reactor; compressible flow
Source: Web Of Science
Added: August 6, 2018

1997 journal article

Molecular layer epitaxy by real-time optical process monitoring

Applied Surface Science, 112(1997 Mar.), 38–47.

By: K. Bachmann, C. Hopfner, N. Sukidi, A. Miller, C. Harris, D. Aspnes , N. Dietz, H. Tran  ...

Sources: NC State University Libraries, ORCID
Added: August 6, 2018