Works (4)

Updated: July 5th, 2023 16:03

1999 journal article

Optimal design of a high pressure organometallic chemical vapor deposition reactor

MATHEMATICAL AND COMPUTER MODELLING, 29(8), 65–80.

By: K. Bachmann n, H. Banks n, C. Hopfner*, G. Kepler n, S. LeSure n, S. McCall n, J. Scroggs n

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: August 6, 2018

1998 journal article

Real-time monitoring of steady-state pulsed chemical beam epitaxy by p-polarized reflectance

JOURNAL OF CRYSTAL GROWTH, 183(3), 323–337.

By: K. Bachmann n, N. Sukidi n, C. Hopfner n, C. Harris n, N. Dietz n, H. Tran n, S. Beeler n, K. Ito n, H. Banks n

co-author countries: United States of America 🇺🇸
author keywords: p-polarized reflectance; surface kinetics; chemical beam epitaxy; real-time process monitoring
Sources: Web Of Science, ORCID
Added: August 6, 2018

1998 journal article

Simulation of a vertical reactor for high pressure organometallic chemical vapor deposition

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 57(1), 9–17.

By: G. Kepler n, C. Hopfner n, J. Scroggs n & K. Bachmann n

co-author countries: United States of America 🇺🇸
author keywords: organometallic chemical vapor deposition; above-atmosphere pressure; numerical simulation; vertical reactor; compressible flow
Source: Web Of Science
Added: August 6, 2018

1997 journal article

Molecular layer epitaxy by real-time optical process monitoring

Applied Surface Science, 112(1997 Mar.), 38–47.

By: K. Bachmann n, C. Hopfner n, N. Sukidi n, A. Miller n, C. Harris n, D. Aspnes n, N. Dietz n, H. Tran n ...

co-author countries: Germany 🇩🇪 United States of America 🇺🇸
Sources: NC State University Libraries, ORCID
Added: August 6, 2018

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