Christian Hopfner

Bachmann, K. J., Banks, H. T., Hopfner, C., Kepler, G. M., LeSure, S., McCall, S. D., & Scroggs, J. S. (1999). Optimal design of a high pressure organometallic chemical vapor deposition reactor. MATHEMATICAL AND COMPUTER MODELLING, 29(8), 65–80. https://doi.org/10.1016/S0895-7177(99)00071-0

Bachmann, K. J., Sukidi, N., Hopfner, C., Harris, C., Dietz, N., Tran, H. T., … Banks, H. T. (1998). Real-time monitoring of steady-state pulsed chemical beam epitaxy by p-polarized reflectance. JOURNAL OF CRYSTAL GROWTH, 183(3), 323–337. https://doi.org/10.1016/s0022-0248(97)00410-7

Kepler, G. M., Hopfner, C., Scroggs, J. S., & Bachmann, K. J. (1998). Simulation of a vertical reactor for high pressure organometallic chemical vapor deposition. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 57(1), 9–17. https://doi.org/10.1016/s0921-5107(98)00256-6

Bachmann, K. J., Hopfner, C., Sukidi, N., Miller, A. E., Harris, C. J., Aspnes, D. E., … Banks, H. T. (1997). Molecular layer epitaxy by real-time optical process monitoring. Applied Surface Science, 112(1997 Mar.), 38–47. https://doi.org/10.1016/S0169-4332(96)00975-0