David Garrett Vellenga Boggiano, M. K., Vellenga, D., Carbonell, R., Ashby, V. S., & DeSimone, J. M. (2006). Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath. POLYMER, 47(11), 4012–4017. https://doi.org/10.1016/j.polymer.2006.03.001