2015 journal article
Multipactor Coating for Sapphire RF Windows Using Remote Plasma-Assisted Deposition
IEEE TRANSACTIONS ON PLASMA SCIENCE, 43(8), 2571–2580.
2013 journal article
Noncrystalline SiO2 and GeO2: Process induced pre-existing defects and vacated O-atom intrinsic bonding sites
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 31(1).
2013 article
Process induced pre-existing defects in non-crystalline SiO2 and GeO2 at vacated O-atom bonding sites and comparisons with Ge-S(Se) alloy bonding sites
XXIST INTERNATIONAL SYMPOSIUM ON THE JAHN-TELLER EFFECT 2012, Vol. 428.
2013 journal article
Remote plasma-processing (RPP), medium range order, and precursor sites for dangling bond defects in "amorphous-Si(H)" alloys: Photovoltaic and thin film transistor devices
SURFACE & COATINGS TECHNOLOGY, 242, 183–186.
2013 journal article
Spectroscopic Detection of Medium Range Order in Device Grade Hydrogenated Amorphous Silicon
JAPANESE JOURNAL OF APPLIED PHYSICS, 52(4).
2011 journal article
Non-crystalline SiO(2): processing induced pre-existing defects associated with vacated O-atom intrinsic bonding sites
Journal of Optoelectronics and Advanced Materials, 13(11-12), 1359–1363.
2011 journal article
O-vacancies in transition metal (TM) oxides: Coordination and local site symmetry of transition and negative ion states in TM2O3 and TMO2 oxides
Microelectronic Engineering, 88(7), 1471–1474.
2011 article
Remote Plasma Enhanced Chemical Deposition of Non-Crystalline GeO2 on Ge and Si Substrates
Lucovsky, G., & Zeller, D. (2011, September). JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, Vol. 11, pp. 7974–7981.
2011 journal article
Remote plasma-deposited GeO2 with quartz-like Ge- and O-local bonding: Band-edge state and O-vacancy comparisons with SiO2
Microelectronic Engineering, 88(7), 1537–1540.
2011 journal article
Spectroscopic detection of medium range order in device quality hydrogenated amorphous silicon, a-Si(H)
Journal of Optoelectronics and Advanced Materials, 13(11-12), 1586–1589.
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