2010 journal article
NixPt1-xSi/n-Si contacts with sub-0.1 eV effective Schottky barrier heights obtained by sulfur segregation
MICROELECTRONIC ENGINEERING, 87(11), 2358–2360.
2010 journal article
Ultrahigh Vacuum Chemical Vapor Deposition of Doped and Intrinsic Si1-xCx Epitaxy from Disilane, Trimethylsilane, and Phosphine
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 157(6), H699–H704.
2009 journal article
Erbium Silicide Formation on Si1-xCx Epitaxial Layers
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 156(5), H378–H383.
2009 journal article
Platinum Germanosilicide Contacts Formed on Strained and Relaxed Si1-xGex Layers
IEEE TRANSACTIONS ON ELECTRON DEVICES, 56(6), 1220–1227.
2009 journal article
Schottky Barrier Height of Erbium Silicide on Si1-xCx
IEEE ELECTRON DEVICE LETTERS, 30(9), 949–951.
2009 journal article
Schottky Barrier Height of Nickel Silicide Contacts Formed on Si1-xCx Epitaxial Layers
IEEE ELECTRON DEVICE LETTERS, 30(12), 1320–1322.
2009 journal article
Tuning of the Nickel Silicide Schottky Barrier Height on p-Type Silicon by Indium Implantation
IEEE ELECTRON DEVICE LETTERS, 30(12), 1272–1274.
2009 journal article
Tuning of the Platinum Silicide Schottky Barrier Height on n-Type Silicon by Sulfur Segregation
IEEE ELECTRON DEVICE LETTERS, 30(4), 331–333.
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