Hanan Hsain

Works (7)

Updated: October 25th, 2023 05:00
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2023 journal article

Development and application of screening-level risk analysis for emerging materials

Sustainable Materials and Technologies, 35, e00524.

By: M. Horgan n, H. Hsain  n, J. Jones n & K. Grieger n 

co-author countries: United States of America 🇺🇸
author keywords: Risk screening; Life cycle; Material development; Hafnia; Piezoelectrics
Sources: Web Of Science, ORCID, Crossref
Added: March 13, 2023

2023 journal article

Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

NANOTECHNOLOGY, 34(12).

By: H. Hsain, Y. Lee, S. Lancaster, P. Lomenzo, B. Xu, T. Mikolajick, U. Schroeder, G. Parsons* , J. Jones*

author keywords: hafnia; ferroelectric; thin film; interlayers; metal-ferroelectric-metal; Al2O3
Sources: Web Of Science, ORCID
Added: February 6, 2023

2023 journal article

Roadmap on ferroelectric hafnia- and zirconia-based materials and devices

APL MATERIALS, 11(8).

By: J. Silva *, R. Alcala *, U. Avci *, N. Barrett *, L. Begon-Lours *, M. Borg *, S. Byun *, S. Chang * ...

co-author countries: Switzerland 🇨🇭 Germany 🇩🇪 Spain 🇪🇸 France 🇫🇷 Greece 🇬🇷 Japan 🇯🇵 Korea (Republic of) 🇰🇷 Netherlands 🇳🇱 Portugal 🇵🇹 Sweden 🇸🇪 United States of America 🇺🇸
Source: Web Of Science
Added: October 23, 2023

2023 journal article

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

JOURNAL OF APPLIED PHYSICS, 133(22).

By: H. Hsain  n, Y. Lee  n, P. Lomenzo *, R. Alcala *, B. Xu *, T. Mikolajick *, U. Schroeder *, G. Parsons n , J. Jones n

co-author countries: Germany 🇩🇪 United States of America 🇺🇸
Sources: Web Of Science, ORCID
Added: June 22, 2023

2022 article

Role of Oxygen Source on Buried Interfaces in Atomic-Layer- Deposited Ferroelectric Hafnia-Zirconia Thin Films

Hsain, H. A., Lee, Y., Lancaster, S., Materano, M., Alcala, R., Xu, B., … Jones, J. L. (2022, September 7). ACS APPLIED MATERIALS & INTERFACES, Vol. 9.

By: H. Hsain n, Y. Lee n, S. Lancaster *, M. Materano *, R. Alcala *, B. Xu *, T. Mikolajick *, U. Schroeder *, G. Parsons n , J. Jones n

co-author countries: Germany 🇩🇪 United States of America 🇺🇸
author keywords: Hf0; 5Zr0; hafnia; zirconia; ferroelectric; orthorhombic; oxygen; texture
Sources: Web Of Science, ORCID
Added: September 26, 2022

2022 journal article

Role of Oxygen Source on Buried Interfaces in Atomic-Layer- Deposited Ferroelectric Hafnia-Zirconia Thin Films

ACS APPLIED MATERIALS & INTERFACES, 14(37), 42232–42244.

By: H. Hsain, Y. Lee, S. Lancaster, M. Materano, R. Alcala, B. Xu, T. Mikolajick, U. Schroeder, G. Parsons , J. Jones

author keywords: Hf0.5Zr0.5O2; hafnia; zirconia; ferroelectric; orthorhombic; oxygen; texture
Sources: Web Of Science, ORCID
Added: October 11, 2022

2022 journal article

Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes

APPLIED PHYSICS LETTERS, 120(23).

By: A. Payne  n, H. Alex Hsain  n, Y. Lee  n, N. Strnad *, J. Jones n & B. Hanrahan *

co-author countries: United States of America 🇺🇸
Source: Web Of Science
Added: June 20, 2022