Hanan Hsain

Horgan, M. D., Hsain, H. A., Jones, J. L., & Grieger, K. D. (2023). Development and application of screening-level risk analysis for emerging materials. Sustainable Materials and Technologies, 35, e00524. https://doi.org/10.1016/j.susmat.2022.e00524

Hsain, H. A., Lee, Y., Lancaster, S., Lomenzo, P. D., Xu, B., Mikolajick, T., … Jones, J. L. (2023). Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface. NANOTECHNOLOGY, 34(12). https://doi.org/10.1088/1361-6528/acad0a

Silva, J. P. B., Alcala, R., Avci, U. E., Barrett, N., Begon-Lours, L., Borg, M., … Schroeder, U. (2023). Roadmap on ferroelectric hafnia- and zirconia-based materials and devices. APL MATERIALS, 11(8). https://doi.org/10.1063/5.0148068

Hsain, H. A., Lee, Y., Lomenzo, P. D., Alcala, R., Xu, B., Mikolajick, T., … Jones, J. L. (2023). Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition. JOURNAL OF APPLIED PHYSICS, 133(22). https://doi.org/10.1063/5.0147124

Hsain, H. A., Lee, Y., Lancaster, S., Materano, M., Alcala, R., Xu, B., … Jones, J. L. (2022, September 7). Role of Oxygen Source on Buried Interfaces in Atomic-Layer- Deposited Ferroelectric Hafnia-Zirconia Thin Films. ACS APPLIED MATERIALS & INTERFACES, Vol. 9. https://doi.org/10.1021/acsami.2c11073

Hsain, H. A., Lee, Y., Lancaster, S., Materano, M., Alcala, R., Xu, B., … Jones, J. L. (2022). Role of Oxygen Source on Buried Interfaces in Atomic-Layer- Deposited Ferroelectric Hafnia-Zirconia Thin Films. ACS APPLIED MATERIALS & INTERFACES, 14(37), 42232–42244. https://doi.org/10.1021/acsami.2c1107342232

Payne, A., Alex Hsain, H., Lee, Y., Strnad, N. A., Jones, J. L., & Hanrahan, B. (2022). Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes. APPLIED PHYSICS LETTERS, 120(23). https://doi.org/10.1063/5.0083656